Introducing SiOC as novel dielectric platform for photonic integration
DOI:
https://doi.org/10.11113/mjfas.v16n1.1458Keywords:
Silicon oxycarbide, sputtering, photonic waveguides, integrated photonics.Abstract
In this paper, we explore the potential of silicon oxycarbide (SiOC) as a novel dielectric platform for integrated photonics and present photonic waveguides. The interesting features of SiOC are its wide tunable window of refractive index and low absorption, that are considered key for large scale photonic integration. It is possible to tune SiOC refractive index from silica glass (1.45) to silicon carbide (3.2) that allows to realize a myriad of photonic passive devices. We have prepared SiOC thin films by employing reactive RF sputtering technique and examined their structural and optical properties using several techniques such as SEM, AFM, ellipsometry, profilometry, and prism coupling. For the first time, SiOC thin films with index of refraction of 1.554 at the standard telecom wavelength 1.55 μm are exploited for the fabrication of photonic waveguides and the propagation losses around 0.37 dB/mm are measured. SiOC photonic waveguides exhibit relatively higher index contrast with silica cladding when compared to traditional Ge-doped silica platform.
References
Wong, C. K., Wong, H., Chan, M., Chow, Y. T., and Chan, H. P. (2008). Silicon oxynitride integrated waveguide for on-chip optical interconnects applications. Microelectr. Reliability, 48(2), 212-218.
Germann, R., Salemink, H. W. M., Beyeler, R., Bona, G. L., Horst, F., Massarek, I., and Offrein, B. J. (2000). Silicon oxynitride layers for optical waveguide applications. J. Electrochem. Soc., 147(6), 2237-2241.
Wörhoff, K., Driessen, A., Lambeck, P. V., Hilderink, L. T. H., Linders, P. W. C., and Popma, Th. J. A. (1999). Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics. Sen. Act. A: Physical, 74(1-3), 9–12.
Giudice, M. D., Bruno, F., Cicinelli, T., and Valli, M. (1990). Structural and optical properties of silicon oxynitride on silicon planar waveguides. Appl. Opt., 29(24), 3489-3496.
Gallis, S., Nikas, V., Huang, M., Eisenbraun, E., and Kaloyeros, A. E. (2007). Comparative study of the effects of thermal treatment on the optical properties of hydrogenated amorphous silicon-oxycarbide. J. App. Phys., 102(2), 24302.
Lu. K., and Erb. D. (2017). Polymer derived silicon oxycarbide-based coatings. Int. Mat. Reviews, 63(3), 139-161.
Melloni, A., Costa, R., Cusmai, G., and Morichetti, F. (2009). The role of index contrast in dielectric optical waveguides. Int. J. Mater. Prod. Technol., 34(4), 421-437.
Mandracci, P., Frascella, F., Rizzo, R., Virga, A., Rivolo, P., Descrovi, E., and Giorgis, F. (2016). Optical and structural properties of amorphous silicon-nitrides and silicon-oxycarbides: Application of multilayer structures for the coupling of Bloch Surface Waves. J. Non-Cryst. Solids, 453, 113–117.
Pradeep. V. S., Graczyk-Zajac, M., Riedel, M. R., and Soraru, G. D. (2014). New insights in to the lithium storage mechanism in polymer derived SiOC anode materials. Electro. Acta., 119, 78–85.
Kim, H. J., Shao, Q., and Kim, Y.-H. (2003). Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection. Sur. Coat. Tech., 171(1-3), 39–45.
Klein, C. A. (2000). How accurate are Stoney’s equation and recent modifications. J. App. Phys., 88(9), 5487-5489.
Metricon Prism Coupler. Model 2010/M Overview. http://www.metri con.com/model-2010-m-overview/ last accessed on 4-June-2017, 14:23.
Woollam, J. A., Co., Inc. (2008). Guide to using WVASE® spectroscopic ellipsometry data acquisition and analysis software. Lincoln, Nebraska: J. A. Woollam Co., Inc.
Memon. F. A., Morichetti, F., and Melloni, A. (2017). Waveguiding light into silicon oxycarbide. Appl. Sci., 7(6), 561.
